In a high vacuum chamber, the e-beam evaporation equipment heats the material by e-beam irradiation until it is vaporized. The material is then deposited onto the surface of the wafer to form a thin film.
In a high vacuum chamber, the e-beam evaporation equipment heats the material by e-beam irradiation until it is vaporized. The material is then deposited onto the surface of the wafer to form a thin film.