Hermes-Epitek’s compound semiconductor etching system offers reliable and cost-effective solutions for the manufacturing of power devices and RF components.
The etching system is designed based on advanced 12-inch semiconductor processing equipment, leveraging the experience gained from 12-inch advanced semiconductor etching processes. As a result, it is built as next-generation 6/8-inch semiconductor etching equipment. The system offers numerous process adjustment capabilities, making it adaptable to a wide range of stringent process specifications.
